Kang, In-Yong: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Printability and inspectability of programmed pit defects on the masks in EUV lithography

La Fontaine, Bruno M., Kang, In-Yong, Seo, Hwan-Seok, Ahn, Byung-Sup, Lee, Dong-Gun, Kim, Dongwan, Huh, Sungmin, Koh, Cha-Won, Cha, Brian, Kim, Seoung-Sue, Cho, Han-Ku, Mochi, Iacopo, Goldberg, Kennet

Year:

2010

Language:

english

File:

PDF, 2.26 MB

english, 2010

2

Serial number coding and decoding by laser interference direct patterning on the original product surface for anti-counterfeiting

Park, In-Yong, Ahn, Sanghoon, Kim, Youngduk, Bae, Han-Sung, Kang, Hee-Shin, Yoo, Jason, Noh, Jiwhan

Journal:

Year:

2017

Language:

english

File:

PDF, 2.89 MB

english, 2017

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - The analysis of EUV mask defects using a wafer defect inspection system

Cho, Kyoung-Yong, Park, Joo-On, Park, Changmin, Lee, Young-Mi, Kang, In-Yong, Yeo, Jeong-Ho, Choi, Seong-Woon, Park, Chan-Hoon, Lange, Steven R., Cho, SungChan, Danen, Robert M., Kirk, Gregory L., Pae

Year:

2010

Language:

english

File:

PDF, 10.46 MB

english, 2010

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Manufacturability of computation lithography mask: current limit and requirements for sub-20nm node

Choi, Jin, Conley, Will, Kang, In-Yong, Park, Ji Soong, Shin, In Kyun, Jeon, Chan-Uk

Year:

2013

Language:

english

File:

PDF, 1.07 MB

english, 2013

5

Characterization of pyrolytic products obtained from fast pyrolysis of chromated copper arsenate (CCA)- and alkaline copper quaternary compounds (ACQ)-treated wood biomasses

Jae-Young Kim, Tae-Sung Kim, In-Yong Eom, Sung Mo Kang, Tae-Su Cho, In Gyu Choi, Joon Weon Choi

Journal:

Journal of Hazardous Materials

Year:

2012

Language:

english

File:

PDF, 787 KB

english, 2012

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Printability and inspectability of defects on EUV blank for 2xnm hp HVM application

Huh, Sungmin, Kang, In-Yong, Jeong, Chang Young, Na, Jihoon, Lee, Dong Ryul, Seo, Hwan-seok, Kim, Seong-Sue, Jeon, Chan-Uk, Doh, Jonggul, Inderhees, Gregg, Ahn, Jinho, Naulleau, Patrick P., Wood II, O

Year:

2012

Language:

english

File:

PDF, 870 KB

english, 2012

7

Identification of the Spotted Fever Group Rickettsiae Detected from Haemaphysalis longicornis in Korea

Lee, Jung-Hee, Park, Hyo-Soon, Jung, Kwang-Don, Jang, Won-Jong, Koh, Seong-Eun, Kang, Shin-Seok, Lee, In-Yong, Lee, Won-Ja, Kim, Bum-Joon, Kook, Yoon-Hoh, Park, Kyung-Hee, Lee, Seung-Hyun

Journal:

Microbiology and Immunology

Year:

2003

Language:

english

File:

PDF, 155 KB

english, 2003

8

Serological Surveillance of Scrub Typhus, Murine Typhus, and Leptospirosis in Small Mammals Captured at Twin Bridges Training Area, Gyeonggi Province, Republic of Korea, 2005–2007

Sames, William J., Klein, Terry A., Kim, Heung-Chul, Gu, Se Hun, Kang, Hae-Ji, Shim, So-Hee, Ha, Si-Jung, Chong, Sung-Tae, Lee, In-Yong, Richards, Allen L., Yi, Suk-Hee, Song, Jin-Won

Journal:

Military Medicine

Year:

2010

Language:

english

File:

PDF, 500 KB

english, 2010

9

Ab initioStudy of the Si Adsorption on Mo(110)

Yoon-Suk Kim, In-Yong Kang, Hanchul Kim, Yong-Chae Chung

Journal:

Journal of Electroceramics

Year:

2004

Language:

english

File:

PDF, 181 KB

english, 2004

10

Structural Characterization of a Mo/Ru/Si Extreme Ultraviolet (EUV) Reflector by Optical Modeling

Kang, In-Yong, Kim, Tae Geun, Lee, Seung Yoon, Ahn, Jinho, Chung, Yong-Chae

Journal:

Japanese Journal of Applied Physics

Year:

2004

Language:

english

File:

PDF, 1.20 MB

english, 2004

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Seo, Hwan-Seok, Schellenberg, Frank M., La Fontaine, Bruno M., Lee, Dong-Gun, Ahn, Byung-Sup, Han, Hakseung, Huh, Sungmin, Kang, In-Yong, Kim, Hoon, Kim, Dongwan, Kim, Seong-Sue, Cho, Han-Ku

Year:

2009

Language:

english

File:

PDF, 4.83 MB

english, 2009

12

Properties and rapid low-temperature consolidation of nanocrystalline Fe-ZrO2composite by pulsed current activated sintering

Hyun-Su Kang, In-Yong Ko, Jin-Kook Yoon, Jung-Mann Doh, Kyung-Tae Hong, In-Jin Shon

Journal:

Metals and Materials International

Year:

2011

Language:

english

File:

PDF, 1.12 MB

english, 2011

13

Characterization of Ru layer for capping/buffer application in EUVL mask

Tae Geun Kim, Seung Yoon Lee, Chung Yong Kim, In-Sung Park, In-Yong Kang, Nae-Eung Lee, Yong-Chae Chung, Jinho Ahn

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 225 KB

english, 2006

14

[Japan Soc. of Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (29-31 Oct. 2003)] Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Structural characterization of Mo/Ru/Si EUV reflector by optical modeling

In-Yong Kang,, Tae Geun Kim,, Seung Yoon Lee,, Jinho Ahn,, Yong-Chae Chung,

Year:

2003

Language:

english

File:

PDF, 142 KB

english, 2003

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Printability and inspectability of defects on the EUV mask for sub-32nm half pitch HVM application

Huh, Sungmin, La Fontaine, Bruno M., Naulleau, Patrick P., Kang, In-Yong, Kim, Sang-Hyun, Seo, Hwan-seok, Kim, Dongwan, Park, Jooon, Kim, Seong-Sue, Cho, Han-Ku, Goldberg, Kenneth, Mochi, Iacopo, Shok

Year:

2011

Language:

english

File:

PDF, 3.38 MB

english, 2011

16

[IEEE Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004. - Osaka, Japan (2004.10.26-2004.10.29)] Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004. - Characteristics of Mo/Ru/Si multilayer reflector structure

Tae Geun Kim,, Woo Sam Kim,, In-Yong Kang,, Yong-Chae Chung,, Jinho Ahn,

Year:

2004

Language:

english

File:

PDF, 212 KB

english, 2004

17

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 16 September 2014)] Photomask Technology 2014 - Study of high sensitivity DUV inspection for sub-20nm devices with complex OPCs

Ackmann, Paul W., Hayashi, Naoya, Han, Sang Hoon, Jung, Hong Yul, Lee, Sun Pyo, Kang, In-Yong, Yoon, Gi Sung, Chung, Dong Hoon, Jeon, Chan-Uk, Brand, Yulia, Eran, Yair, Bar-Shean, Yoad, Chereshnya, Al

Year:

2014

Language:

english

File:

PDF, 2.62 MB

english, 2014

18

[IEEE 2012 International Conference on High Voltage Engineering and Application (ICHVE) - Shanghai, China (2012.09.17-2012.09.20)] 2012 International Conference on High Voltage Engineering and Application - A study of validation of condition monitoring method of NPPs cable through volume electrical resistivity

In-Yong Kim,, Cheol-Soo Goo,, Jung-Hoon Lee,, Beom-soo Jin,, Myeong-Kyun Kang,, Yong-Deok Shin,

Year:

2012

Language:

english

File:

PDF, 1.32 MB

english, 2012

19

Prevalence of Anaplasma , Bartonella and Borrelia Species in Haemaphysalis longicornis collected from goats in North Korea

Kang, Jun-Gu, Ko, Sungjin, Smith, W. Barney, Kim, Heung-Chul, Lee, In-Yong, Chae, Joon-Seok

Journal:

Journal of Veterinary Science

Year:

2016

Language:

english

File:

PDF, 6.35 MB

english, 2016

20

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Combined absorber stack for optimization of the EUVL mask

Lee, Seung Y., Lercel, Michael J., Kim, Tae G., Kim, Chung Y., Kang, In-Yong, Chung, Yong-Chae, Ahn, Jinho

Year:

2006

Language:

english

File:

PDF, 2.63 MB

english, 2006

21

1,3,5-Trihydroxybenzene as a film-forming additive for high-voltage positive electrode

Kang, Yoon-Sok, Yoon, Taeho, Lee, Seok Soo, Mun, Junyoung, Park, Min Sik, Park, Jin-Hwan, Doo, Seok-Gwang, Song, In-Yong, Oh, Seung M.

Journal:

Electrochemistry Communications

Year:

2013

Language:

english

File:

PDF, 513 KB

english, 2013

22

Ab initio investigation of interfacial layer formation in the Mo∕Si boundary for extreme ultraviolet lithography

Kang, In-Yong, Chung, Yong-Chae

Journal:

Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 797 KB

english, 2008

23

Development of a light-emitting-diode-based bidirectional active remote-sensing system for monitoring crop growth

Jo, Seunghyun, Eom, In-Yong, Ko, Jonghan, Kang, Sinkyu

Journal:

International Journal of Remote Sensing

Year:

2015

Language:

english

File:

PDF, 1.83 MB

english, 2015

24

Numerical Investigation of Defect Printability in Extreme Ultraviolet (EUV) Reflector: Ru/Mo/Si Multilayer System

Kang, In-Yong, Ahn, Jinho, Oh, Hye-Keun, Chung, Yong-Chae

Journal:

Japanese Journal of Applied Physics

Year:

2005

Language:

english

File:

PDF, 113 KB

english, 2005

25

[IEEE Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (2005.10.25-2005.10.28)] Digest of Papers Microprocesses and Nanotechnology 2005 - Aerial image characteristics of modified absorber model for extreme ultraviolet lithography (EUVL)

In-Yong Kang,, Jinho Ahn,, Hye-Keun Oh,, Yong-Chae Chung,

Year:

2005

Language:

english

File:

PDF, 776 KB

english, 2005

26

Properties and rapid consolidation of nanostructured MgO–MgAl2O4 composites

In-Jin Shon, In-Yong Ko, Hyun-Su Kang, Kyung-Tae Hong, Jung-Mann Doh, Jin-Kook Yoon

Journal:

Ceramics International

Year:

2012

Language:

english

File:

PDF, 1.13 MB

english, 2012

27

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Numerical modeling of absorber characteristics for EUVL

Kang, In-Yong, Lercel, Michael J., Ahn, Jinho, Oh, Hye-Keun, Chung, Yong-Chae

Year:

2006

Language:

english

File:

PDF, 311 KB

english, 2006

28

Phytotoxic mechanisms of bur cucumber seed extracts on lettuce with special reference to analysis of chloroplast proteins, phytohormones, and nutritional elements

Lee, Seok-Min, Radhakrishnan, Ramalingam, Kang, Sang-Mo, Kim, Jin-Hyo, Lee, In-Yong, Moon, Bong-Kyu, Yoon, Byung-Wook, Lee, In-Jung

Journal:

Ecotoxicology and Environmental Safety

Year:

2015

Language:

english

File:

PDF, 1.06 MB

english, 2015

29

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Printability study of pattern defects in the EUV mask as a function of hp nodes

Kim, Tae-Geun, Seo, Hwan-Seok, Kang, In-Yong, Jeong, Chang Young, Huh, Sungmin, Na, Jihoon, Kim, Seong-Sue, Jeon, Chan-Uk, Mochi, Iacopo, Goldberg, Kenneth A., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.20 MB

english, 2012

30

Properties and rapid consolidation of nanostructured Al2O3-Al2SiO5 composites by high frequency induction heated sintering

In-Jin Shon, In-Yong Ko, Hyun-Su Kang, Kyung-Tae Hong, Jung-Mann Doh, Jin-Kook Yoon

Journal:

Ceramics International

Year:

2011

Language:

english

File:

PDF, 1.14 MB

english, 2011

31

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - EUVL mask inspection using 193nm wavelength for 30nm node and beyond

Na, Jihoon, Maurer, Wilhelm, Abboud, Frank E., Cho, Wonil, Kim, Tae-Geun, Kang, In-Yong, Cha, Byungcheol, Shin, Inkyun, Cho, Han-Ku

Year:

2011

Language:

english

File:

PDF, 4.36 MB

english, 2011

32

Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL)

In-Yong Kang, Jinho Ahn, Chung Yong Kim, Hye-Keun Oh, Yong-Chae Chung

Journal:

Microelectronic Engineering

Year:

2007

Language:

english

File:

PDF, 398 KB

english, 2007

33

Rapid synthesis and consolidation of nanostuctured Al2O3-MgSiO3composites by high frequency induction heated sintering

In-Jin Shon, In-Yong Ko, Hyun-Su Kang, Kyung-Tae Hong, Jung-Mann Doh, Jin-Kook Yoon

Journal:

Metals and Materials International

Year:

2012

Language:

english

File:

PDF, 773 KB

english, 2012

34

Optimization of Low-Energy Electron Beam Proximity Lithography Stencil Mask Structure Factors by Monte Carlo Simulation

Kim, Chiho, Kang, In-Yong, Chung, Yong-Chae

Journal:

Japanese Journal of Applied Physics

Year:

2004

Language:

english

File:

PDF, 137 KB

english, 2004

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

La Fontaine, Bruno M., Seo, Hwan-Seok, Lee, Dong-Gun, Ahn, Byung-Sup, Koh, Cha-Won, Kang, In-Yong, Kim, Tae Geun, Kim, Hoon, Kim, Dongwan, Kim, Seong-Sue, Cho, Han-Ku

Year:

2010

Language:

english

File:

PDF, 1.57 MB

english, 2010

36

Serological Surveillance of Scrub Typhus, Murine Typhus, and Leptospirosis in Small Mammals Captured at Twin Bridges Training Area, Gyeonggi Province, Republic of Korea, 2005–2007

Sames, William J., Klein, Terry A., Kim, Heung-Chul, Gu, Se Hun, Kang, Hae-Ji, Shim, So-Hee, Ha, Si-Jung, Chong, Sung-Tae, Lee, In-Yong, Richards, Allen L., Yi, Suk-Hee, Song, Jin-Won

Journal:

Military Medicine

Year:

2010

File:

PDF, 500 KB

2010

37

Effective passivation of a high-voltage positive electrode by 5-hydroxy-1H-indazole additives

Kang, Yoon-Sok, Yoon, Taeho, Mun, Junyoung, Park, Min Sik, Song, In-Yong, Benayad, Anass, Oh, Seung M.

Journal:

Journal of Materials Chemistry A

Year:

2014

Language:

english

File:

PDF, 868 KB

english, 2014

38

Ultrasonographic Findings of Medullary Thyroid Carcinoma: a Comparison with Papillary Thyroid Carcinoma

Kim, Sung-Hun, Kim, Bum-Soo, Jung, So-Lyung, Lee, Jung-Whee, Yang, Po-Sung, Kang, Bong-Joo, Lim, Hyun-Wook, Kim, Jee-Young, Whang, In-Yong, Kwon, Heuk-Sang, Jung, Chan-Kwon

Journal:

Korean Journal of Radiology

Year:

2009

Language:

english

File:

PDF, 111 KB

english, 2009

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